SPIE Advanced Lithography + Patterning

SPIE Advanced Lithography + Patterning is a meeting for the people who make semiconductor patterns printable and repeatable: lithographers, resist developers, metrology specialists and equipment engineers. The San Jose symposium brings technical papers together with an exhibition of materials, electron-beam systems, wafer treatments and the precision hardware that supports those processes. Around 2,500 people and 80 exhibitors attended in 2026.